Resist Strip and Cu Diffusion Barrier Etch in Cu BEOL Integration Schemes in a Mattson HighlandsTM Chamber

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Periodical:

Solid State Phenomena (Volume 92)

Edited by:

Marc Heyns, Paul Mertens and Marc Meuris

Pages:

267-270

DOI:

10.4028/www.scientific.net/SSP.92.267

Citation:

G. Mannaert et al., "Resist Strip and Cu Diffusion Barrier Etch in Cu BEOL Integration Schemes in a Mattson HighlandsTM Chamber", Solid State Phenomena, Vol. 92, pp. 267-270, 2003

Online since:

May 2003

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$35.00

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