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HomeSolid State PhenomenaSolid State Phenomena Vol. 93Gate-Insulator Film Deposition by Remote Plasma...

Gate-Insulator Film Deposition by Remote Plasma Chemical Vapour Deposition for Low-Temperature Poly-Si Thin-Film Transistors

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Abstract:

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Polycrystalline Semiconductors VII

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Periodical:

Solid State Phenomena (Volume 93)

Pages:

73-78

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.93.73

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Online since:

June 2003

Authors:

Yasuaki Murata, Masataka Itoh, Shinji Morozumi

Keywords:

Gate Insulator, Inductively Coupled Plasma, Polycrystalline Silicon, Remote Plasma Chemical Vapor Deposition, Thin Film Transistor

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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