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HomeSolid State PhenomenaSolid State Phenomena Vols. 95-96Nitrogen Out-Diffusion from Czochralski Silicon...

Nitrogen Out-Diffusion from Czochralski Silicon Monitored by Depth Profiles of Shallow Thermal Donors

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Periodical:

Solid State Phenomena (Volumes 95-96)

Pages:

117-122

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.95-96.117

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Online since:

September 2003

Authors:

Vladimir V. Voronkov, A.V. Batunina, G.I. Voronkova, Robert J. Falster

Keywords:

Nitrogen, Out-Diffusion, Oxygen, Silicon, Thermal Donor

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© 2004 Trans Tech Publications Ltd. All Rights Reserved

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[1] V.V. Voronkov and R. Falster, this proceeding volume (2003).

[2] T. Itoh and T. Abe, Appl. Phys. Lett., 53, 39 (1988).

[3] M. Suezawa, K. Sumino, H. Harada and T. Abe, Jpn. J. Appl. Phys., Part 1, 25, L859 (1986).

[4] D. Yang, R. Fan, L. Li, D. Que and K. Sumino, Appl. Phys. Lett., 68, 487 (1996).

[5] A. Hara, M. Aoki, M. Koizuka and T. Fukuda, J. Appl. Phys. 75, 2929 (1994).

[6] V.V. Voronkov, M. Porrini, P. Collareta, M.G. Pretto, R. Scala, R. Falster, G.I. Voronkova, A.V. Batunina, V.N. Golovina, L.V. Arapkina, A.S. Guliaeva and M.G. Milvidski, J. Appl. Phys., 89, 4289 (2001).

DOI: 10.1063/1.1356436

[1] (open symbols).