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Papers by Author: Mikhail R. Baklanov

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Study of a Metal Gate and Silicon Selective “Dry Ash Only” Process for Combined Extension and Halo Implanted Photo Resist

Authors: G. Mannaert, Mikhail R. Baklanov, D. Goossens, Johann Vertommen, Werner Boullart

113

Effects of Bias, Pressure and Temperature in Plasma Damage of Ultra Low-k Films

Authors: A.M. Urbanowicz, A. Humbert, G. Mannaert, Z. Tokei, Mikhail R. Baklanov

317

Effect of Chemical Solution on the Stability of Low-k Films

Authors: Els Kesters, Quoc Toan Le, Mikhail R. Baklanov, Werner Boullart, Paul W. Mertens

Abstract: The compatibility of chemical solutions with different pH is studied on microporous silica-based (SiOCH) and mesoporous methylsilsesquioxane (MSQ) based low-k materials. The surface and bulk properties of as-deposited and O2/CF4 plasma-treated low-k films have been studied after several wet treatments.

349

HF Based Solutions for HfO₂ Removal; Effect of pH and Temperature on HfO₂: SiO₂ Etch Selectivity

Authors: Vasile Paraschiv, Martine Claes, Mikhail R. Baklanov, Werner Boullart, Stefan De Gendt, Serge Vanhaelemeersch

Silicon Surface Cleaning after Spacer Dry Etching

Authors: Denis Shamiryan, Mikhail R. Baklanov, Serge Vanhaelemeersch

303

Modification of Low-K SiCOH Film Porosity by a HF Solution

Authors: Denis Shamiryan, Mikhail R. Baklanov, Guy Vereecke, Serge Vanhaelemeersch, Karen Maex

135

The Optimization of the Cleaning to Remove Residual Bonds of Si-C and Si-F after Fluorocarbon Plasma Etch on the Silicon Surface

Authors: Y.B. Kim, Mikhail R. Baklanov, Thierry Conard, Serge Vanhaelemeersch, W. Vandervorst

291

Characterization of HF Cleaning of Ion-Implanted Si Surfaces

Authors: E. Kondoh, Mikhail R. Baklanov, Karen Maex

271

Evaluation of Post Metal Etch Cleaning by Analyzing the Chemical Compositions and Distributions on the Etched Al Surface

Authors: Hua Ling Li, Mikhail R. Baklanov, Werner Boullart, Thierry Conard, B. Brijs, W. Vandervorst, Karen Maex, Ludo Froyen

177

XPS Study of the Cleaning Efficiency by Ozone Processes of the Protective Films Formed by Reactive Ion Etching of Co and Ti Silicide

Authors: Thierry Conard, Stefan De Gendt, Mikhail R. Baklanov, Rita Vos, Marc Heyns, W. Vandervorst

139