Nanosteps Preparation Based on Focused Ion Beam Technique

Abstract:

In this paper, nanosteps were fabricated by a new method. This method used the energy of focus imaging of focused ion beam to peel the material surface for fabricating the nanosteps. By changing the number of focus imaging can get different deepness nanosingle-steps. Changing the magnification, the second-step can be fabricated on nanosingle-step. An atomic force microscopy was used to measure the 3D morphology of nanosteps. When the magnification was 25000, the deepness of nanosingle-step was 65.34±3.00 nm and the deepness of the first step of nanodual-step was 56.03 nm. When the magnification was 50000, the deepness of nanosingle-step was 142.28±3.54 nm and the deepness of the second step of nanodual-step was 178.68nm. This means that the redeposition made the deepness of the first step become bigger, that of the second step becomes smaller. Based on comparison and analysis, the relation of the depth, the magnification and the number of the focus imaging were obtained.

• Periodical: Applied Mechanics and Materials (Volume 870)
• Pages: 114-119
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.870.114
• Online since: September 2017
• Authors: Chen Ying Wang, Wei Xuan Jing, Yi Jun Zhang, Ming Liu, Qi Jing Lin, Zhuang De Jiang
• Keywords: Atomic Force Microscopy (AFM), Focused Ion Beam (FIB), Nanofabrication, Nanostep

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