Preliminary Results of Numerical Profiles for the Simultaneous Diffusion of Boron and Point Defects in Silicon using Irreversible Thermodynamic Theory

Abstract:

Article Preview

Info:

Periodical:

Defect and Diffusion Forum (Volumes 194-199)

Edited by:

Y. Limoge and J.L. Bocquet

Pages:

647-652

DOI:

10.4028/www.scientific.net/DDF.194-199.647

Citation:

D. K. An and V. B. Dung, "Preliminary Results of Numerical Profiles for the Simultaneous Diffusion of Boron and Point Defects in Silicon using Irreversible Thermodynamic Theory", Defect and Diffusion Forum, Vols. 194-199, pp. 647-652, 2001

Online since:

April 2001

Export:

Price:

$35.00

In order to see related information, you need to Login.