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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 194-199Self Interstitials, Vacancies and Oxygen Atoms in...

Self Interstitials, Vacancies and Oxygen Atoms in CZ Silicon

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Diffusion in Materials DIMAT2000

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Periodical:

Defect and Diffusion Forum (Volumes 194-199)

Pages:

641-646

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.194-199.641

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Online since:

April 2001

Authors:

Takahisa Okino, Toshitada Shimozaki, Chan Gyu Lee

Keywords:

Diffusion, Grown-in Defects, Oxygen Atom, Point Defect, Self-Interstitial, Silicon, Vacancy

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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