Defect and Diffusion Forum

Description: This volume is aimed at diffusion non-specialists who may find at some time that they need a handy guide to the tracer diffusional behaviour of one element in another element. Those working on new coating, or other commercial processes, might for example need basic diffusion data in order to decide on the initial settings of the new-process parameters. Theoreticians who are seeking empirical trends in diffusivities may also find the contents to be of great interest.
The information is presented in the form of abstracts, gathered mainly from the 241-volume series of Defect and Diffusion Forum (and its antecedents); with their coverage of 38 years of diffusion research up to 2004. In the case of certain elements, such as silicon, even earlier data are included.

Description: This seventh volume in the series covering the latest results in the field includes abstracts of papers which appeared between the publication of Annual Retrospective VI (Volumes 224-225) and the end of November 2004 (allowing for vagaries of journal availability).

Description: This seventh volume in the series covering the latest results in the field includes abstracts of papers which appeared between the publication of Annual Retrospective VI (Volumes 221-223) and the end of September 2004 (allowing for vagaries of journal availability).

Description: This seven-year retrospective covers the significant results, reported in these fields during that time, and includes abstracts of papers which appeared after the publication of Defect and Diffusion Forum, Volumes 150-151 and Volumes 181-182, (which were last to cover these topics systematically) and the end of August 2004 (allowing for vagaries of journal availability).

Description: This sixth volume in the series covering the latest results in the field includes abstracts of papers which appeared between the publication of Annual Retrospective V (Volumes 218-220) and the end of April 2004 (journal availability permitting).

Description: This sixth volume in the series covering the latest results in the field includes abstracts of papers which appeared between the publication of Annual Retrospective V (Volumes 213-215) and the end of October 2003.

Description: This volume of the annual series contains nearly 800 selected abstracts of recent research in the semiconductor field: dating up to about September 2003 (depending upon individual source publication dates).

Description: This latest volume of the annual series contains over 900 selected abstracts of research in the field of ceramics (including, for this purpose, allotropes of carbon); reported between the appearance of Retrospective IV and about June 2003 (allowing for variations in publication dates).

Description: This volume contains the proceedings of the conference, 'Diffusion, Segregation and Stresses in Materials (DSS-02)', which was held at the Moscow State Institute of Steel and Alloys, Moscow, Russia. The participants, all acknowledged experts in their field, were drawn from 15 countries and interchanged their expertise via 90 scheduled lectures, plus poster sessions and many informal discussions.
Volume is indexed by Thomson Reuters CPCI-S (WoS).

Description: This issue covers, in the form of abstracts, the work which has been reported between the previous retrospective and the end of 2002. The choice of abstracted papers is guided by criteria such as accessibility, data content and description of important new techniques, phenomena or anomalies. There is also a thorough coverage of qualitative features of diffusion and defect phenomena, computer modelling and theory. The volume also includes invited review and experimental papers which treat a wide range of topics in the field.