Optics Design and Precision Manufacturing Technologies

Volumes 364-366

doi: 10.4028/www.scientific.net/KEM.364-366

Paper Title Page

Authors: Choung Lii Chao, Wei Haw Fan, Wen Chen Chou, Chun Yu Chien, Hung Yi Lin, Jaime G. Duduch

Abstract: Polycrystalline CVD diamond film possesses many advanced physical and mechanical properties which makes it a very important engineering...

668
Authors: Pai Shan Pa

Abstract: It is difficult to execute the polishing process for swords surface. This study provides a design of sword-form electrode and a new area...

674
Authors: Pai Shan Pa

Abstract: The most effective geometry for design electrode and the advantage of low cost equipment in ultrasonic-aided electrochemical finishing for...

680
Authors: Yu Hui Sun, Ren Ke Kang, Dong Ming Guo

Abstract: LCOS panel as a kind of new LCD is a sort of liquid crystal display device that operates in a reflective mode. In this paper, a method on...

686
Authors: Ju Long Yuan, D.X. Hu, Zhi Wei Wang, Dong Hui Wen

Abstract: With increasing trend toward automatic manufacture and demands for improved quality, position of ultra-precision machining processes is...

690
Authors: Shi Chao Xiu, Suo Xian Yuan, Chang He Li, Guang Qi Cai

Abstract: According to the analysis in theory, the model of quick-point grinding is different from conventional cylindrical grinding because it is...

696
Authors: Ekkard Brinksmeier, Ralf Gläbe

Abstract: As is well known, excessive chemical tool wear occurs when steel alloys are machined with monocrystalline diamond tools prevents many...

701
Authors: Ying Xue Yao, Shun Zhou Yu, Da Gang Xie

Abstract: Bonnet tool polishing, combined traditional optical polishing technique with modern NC technology, is an novel optical polishing technique....

707
Authors: Dong Woo Kim, Young Jae Shin, Kyoung Taik Park, Eung Sug Lee, Jong Hyun Lee, Myeong Woo Cho

Abstract: The objective of this research was to apply the artificial neural network algorithm to predict the surface roughness in high speed milling...

713
Authors: Quan Liu, Jian Hong Wu, Ling Ling Fang, Chao Ming Li

Abstract: A fused silica phase mask with the period of 1069nm, and ruled area 50×50mm2 has been fabricated by a new technique, which combines...

719

Showing 121 to 130 of 235 Paper Titles