Subsurface Structures of Monocrystalline Silicon Generated by Nanogrinding

Abstract:

This paper reports the effect of nanogrinding conditions on the formation of subsurface structures of monocrystalline silicon (100) substrates. It was found that the amorphization and the transformation of high pressure phases were related to the grit depth of cut employed in nanogrinding. The formation mechanisms were found to be different from those previously reported from the nanoindentation studies.

• Periodical: Key Engineering Materials (Volumes 389-390)
• Pages: 465-468
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.389-390.465
• Online since: September 2008
• Authors: Han Huang, Y.Q. Wu, Y. Wang, Jin Zou, Li Bo Zhou
• Keywords: Nanogrinding, Nanoscratch, Removal Mechanism, Silicon, Subsurface Damage

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