Effect of Stacking Layers on the Structure and Properties of Ca(Mg1/3Nb2/3)O3 / CaTiO3 Thin Films

Article Preview

Abstract:

Effect of stacking layers on the structure and properties of Ca(Mg1/3Nb2/3)O3/CaTiO3 (CMN/CT) microwave dielectric heterogeneous thin films prepared was investigated. Precursor solutions for CMN and CT synthesis were obtained by Pechini method. The arrangement pattern has affected structure and properties of heterogeneous thin film. The CMN-CT arrangement heterostructure thin film has second phase from the CMN films layer. The CT-CMN heterostructure film which has a smooth and dense microstructure was composed of pure perovskite phase without any second phase, this result was attributed to the CT film layer which is a buffer layer between substrate and CMN film layer. At 1MHz frequency, CT-CMN exhibits the dielectric properties of εr=47.5, tanδ=0.020.

You might also be interested in these eBooks

Info:

Periodical:

Key Engineering Materials (Volumes 421-422)

Pages:

115-118

Citation:

Online since:

December 2009

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2010 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] B. D. Lee, H. R. Lee and K. H. Yoon, J. Appl. Phys. Part 1., 44 (2005), p.1326.

Google Scholar

[2] B. D. Lee, H. R. Lee and K. H. Yoon, Ceram. Int., 31 (2005), p.143.

Google Scholar

[3] B. D. Lee, H. R. Lee and K. H. Yoon, J. Am. Ceram. Soc., 88 (2005), p.1197.

Google Scholar

[4] J. Y. Cho, K. H. Yoon and E. S. Kim, J. Am. Ceram. Soc., 86 (2003), p.1330.

Google Scholar

[5] L. Li, X. M. Chen, J. Am. Ceram. Soc., 89 (2006), p.2514.

Google Scholar

[6] L. Li, X. M. Chen and X. C. Fan, J. Eur. Ceram. Soc., 26 (2006), p.3265.

Google Scholar

[7] C. L. Huang, H. L. Chen and C. C. Wu, Mater. Res. Bull., 36 (2001), p.1645.

Google Scholar

[8] M.P. Pechini, US Patent, 3 330 697, 11 July (1967).

Google Scholar

[9] J. Zhu, J. Zhou and L. S. Xu, Synth. React. Inorg. Met-Org. Nan., 38 (2008), p.168. e-mail: chenw@whut. edu. cn Fax: +86-27-87864580.

Google Scholar