Paper Titles

Germanium Impurity Diffusion in Boron Doped Silicon
p.127

Diffusion of Tellurium in Silicon
p.133

Behaviour of Substitutional Gold in Silicon
p.139

Nature and Generation Mechanism of Butterfly-Type Intrinsic Gettering Centers in Oxygen-Free Silicon Crystals
p.145

Distribution of Cobalt in Silicon after Phosphorous Diffusion Gettering
p.151

Transient Defects Kinetics during Silicon Oxidation and Diffusion Phenomena
p.157

Migration of Interstitial Boron in Silicon
p.163

Solubility, Diffusion and Ion-Pairing of Cobalt in Extrinsic Silicon at 700°C
p.169

Diffusion and Conductivity of Potassium Impurity in Silicon and Germanium
p.175

HomeMaterials Science ForumMaterials Science Forum Vols. 10-12Distribution of Cobalt in Silicon after...

Distribution of Cobalt in Silicon after Phosphorous Diffusion Gettering

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Defects in Semiconductors 14

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Periodical:

Materials Science Forum (Volumes 10-12)

Pages:

151-156

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.10-12.151

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Online since:

January 1986

Authors:

R. Kühnapfel, Wolfgang Schröter, D. Gilles

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© 1986 Trans Tech Publications Ltd. All Rights Reserved

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