HYPREZ Wafering Solutions: A Novel Approach of SiC Wafering Solution

Abstract:

A novel approach for processing SiC wafers has been developed to grind then polish 150 and 200mm SiC wafers without lapping. The purpose of this work was to optimize the processing of SiC wafers sliced from boules to finished epi-ready wafers by grinding and chemical-mechanical polishing (CMP). Diamond vitrified wheels were used for coarse and fine grinding to correct the irregular shape of SiC wafers before reducing surface roughness by CMP. 4H-SiC wafers were sliced by diamond embedded/slurry wire saw and laser split techniques. Incoming wafer condition was seen to affect coarse grinding wheel performance depending on incoming surface roughness and shape. Wheel characteristics, including abrasive size, abrasive concentration, and bond structure, were adjusted to improve grinding efficiency based on incoming conditions. Coarse grinding wheels were able to reduce wafer total thickness variation to 3-5um and average surface roughness to 20-30nm (Ra). Fine grinding wheels were optimized to reduce total thickness variation (TTV) below 2um and surface roughness to 1-2nm Ra and peak-to-valley height of 20-30nm (Rt). Coarse and fine wafering time was less than 30 minutes total to remove 50 microns on both Si and C-face per wafer. Surface damage from grinding was removed after one hour of polishing each wafer by CMP, achieving surface roughness of 0.4nm Ra and 5-7nm Rt. The benefit of optimizing coarse and fine grinding of 150 and 200mm SiC wafers is demonstrated by producing flat wafers, which reduced overall processing time to prepare an epi-ready condition by CMP.

• Periodical: Materials Science Forum (Volume 1124)
• Pages: 13-19
• DOI: https://doi.org/10.4028/p-5QTTgN
• Online since: August 2024
• Authors: Giho Lee, Andrew Hartmann*, Salman Kassir
• Keywords: CMP, Grinding, Polishing, Processing, SiC, Wafering

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