Investigation on Bipolar Degradation Caused by In-Grown Stacking Fault in 3.3kV SiC-MOSFET

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Abstract:

This study investigates the role of in-grown stacking faults (SF) in the bipolar degradation of 3.3 kV SiC-MOSFETs, emphasizing their significant contribution to both on-resistance (VDSon) and leakage current (IDSX) degradation. A high current stress was applied to over 1,500 chips, resulting in 72 degraded devices, with 45 exhibiting notable IDSX degradation. A detailed analysis revealed that most IDSX degraded chips contained bar-shaped in-grown SFs, suggesting a correlation between these defects and leakage current degradation. These findings indicate that peculiar basal plane dislocations associated with in-grown SFs may be critical contributors to IDSX degradation, indicating the need for further research to elucidate the mechanisms behind this degradation in SiC-MOSFETs.

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[1] A. Galeckas, J. Linnros, and P. Pirouz, Appl. Phys. Lett., vol.81 (2002), p.883.

Google Scholar

[2] M. Skowronski and S. Ha, J. Appl. Phys., vol. 99 (2006), p.011101.

Google Scholar

[3] K. Konishi, S. Yamamoto, S. Nakata, Y. Nakanishi, T. Tanaka, Y. Mitani, N. Tomita, Y. Toyoda, and S. Yamakawa, J. Appl. Phys., vol. 114 (2013), p.014504.

Google Scholar

[4] A. Agarwal, H. Fatima, S. Haney, and S.-H. Ryu, IEEE Electron Device Lett., vol. 28 (2007), p.587.

Google Scholar

[5] R. Stahlbush, Q. Zhang, A. Agarwal, and N. A. Mahadik, Mater. Sci. Forum, vol. 717-720 (2012), p.387.

Google Scholar

[6] S. A. Mancini, S. Y. Jang, Z. Chen, D. Kim, J. Lynch, Y. Liu, B. Raghothamachar, M. Kang, A. Agarwal, N. Mahadik, R. Stahlbush, M. Dudley, and W. Sung, Proc. IRPS 2022, pp.62-1.

DOI: 10.1109/irps48227.2022.9764538

Google Scholar

[7] T. Ishigaki, T. Murata, K. Kinoshita, T. Morikawa, T. Oda, R. Fujita, K. Konishi, Y. Mori, and A. Shima, Proc. ISPSD 2019, p.259.

DOI: 10.1109/ispsd.2019.8757598

Google Scholar

[8] H. Niwa, T. Tanaka, K. Ishibashi, H. Amishiro, A. Imai, Y. Kagawa, K. Sugawara, and T. Watahiki, Solid State Phenomena, vol. 375 (2025), p.63.

DOI: 10.4028/p-1n8gyx

Google Scholar

[9] E. Kodolitsch, A. Kabakow, V. Sodan, M. Krieger, H. Weber, and N. Tsavdaris, J. Phys. D: Appl. Phys., vol. 56 (2023) p.315101.

DOI: 10.1088/1361-6463/acd127

Google Scholar