Role of Hydrogen in Semiconductor, Dielectric and Metal Deposition onto InP by Means of Rapid Thermal Low Pressure Metalorganic Chemical Vapor Deposition

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Periodical:

Materials Science Forum (Volumes 148-149)

Edited by:

S.J. Pearton

Pages:

61-112

DOI:

10.4028/www.scientific.net/MSF.148-149.61

Citation:

A. Feingold and A. Katz, "Role of Hydrogen in Semiconductor, Dielectric and Metal Deposition onto InP by Means of Rapid Thermal Low Pressure Metalorganic Chemical Vapor Deposition", Materials Science Forum, Vols. 148-149, pp. 61-112, 1994

Online since:

December 1993

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