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HomeMaterials Science ForumMaterials Science Forum Vols. 258-263Thermal Stability of Hydrogen Molecule in...

Thermal Stability of Hydrogen Molecule in Crystalline Silicon

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Defects in Semiconductors 19

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Periodical:

Materials Science Forum (Volumes 258-263)

Pages:

211-216

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.258-263.211

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Online since:

December 1997

Authors:

N. Fukata, Kenji Murakami, K. Ishioka, K.G. Nakamura, M. Kitajima, S. Fujimura, Jun Kikuchi, Hajime Haneda

Keywords:

Diffusion, Hydrogen Molecules, Raman Scattering, Silicon, Thermal Annealing

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© 1997 Trans Tech Publications Ltd. All Rights Reserved

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