Low Temperature Hydrogen Diffusion in Silicon: Influence of Substrate Quality and the Surface Damage

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Periodical:

Materials Science Forum (Volumes 258-263)

Edited by:

Gordon Davies and Maria Helena Nazaré

Pages:

191-196

DOI:

10.4028/www.scientific.net/MSF.258-263.191

Citation:

M.I. Symko et al., "Low Temperature Hydrogen Diffusion in Silicon: Influence of Substrate Quality and the Surface Damage", Materials Science Forum, Vols. 258-263, pp. 191-196, 1997

Online since:

December 1997

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$35.00

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