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HomeMaterials Science ForumMaterials Science Forum Vols. 287-288Recent Results on Reactive Magnetron Sputtering...

Recent Results on Reactive Magnetron Sputtering for High-Rate Deposition of Ceramic Compound Films

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Trends and New Applications of Thin Films

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Periodical:

Materials Science Forum (Volumes 287-288)

Pages:

107-118

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.287-288.107

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Online since:

August 1998

Authors:

A. Billard, C. Frantz

Keywords:

Arcing, Ceramic Compound Films, Control Techniques, High Rate Deposition, Modulated Discharge, Pulsed Discharge, Reactive Magnetron Sputtering, Sputtering Instability

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Сopyright:

© 1998 Trans Tech Publications Ltd. All Rights Reserved

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