Recent Results on Reactive Magnetron Sputtering for High-Rate Deposition of Ceramic Compound Films

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Periodical:

Materials Science Forum (Volumes 287-288)

Edited by:

Horst Hoffmann

Pages:

107-118

DOI:

10.4028/www.scientific.net/MSF.287-288.107

Citation:

A. Billard and C. Frantz, "Recent Results on Reactive Magnetron Sputtering for High-Rate Deposition of Ceramic Compound Films", Materials Science Forum, Vols. 287-288, pp. 107-118, 1998

Online since:

August 1998

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$35.00

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