Spectroellipsometric Method for Process Monitoring of Semiconductor Thin Films and Interfaces

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Periodical:

Materials Science Forum (Volumes 287-288)

Edited by:

Horst Hoffmann

Pages:

151-158

Citation:

R. Brenot et al., "Spectroellipsometric Method for Process Monitoring of Semiconductor Thin Films and Interfaces", Materials Science Forum, Vols. 287-288, pp. 151-158, 1998

Online since:

August 1998

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