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HomeMaterials Science ForumMaterials Science Forum Vols. 287-288Spectroellipsometric Method for Process Monitoring...

Spectroellipsometric Method for Process Monitoring of Semiconductor Thin Films and Interfaces

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Periodical:

Materials Science Forum (Volumes 287-288)

Pages:

151-158

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.287-288.151

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Online since:

August 1998

Authors:

R. Brenot, Morten Kildemo, B. Drévillon

Keywords:

Approximation of Reflection Coefficient, Gradient-Index, PECVD, Real-Time Control, Real-Time Monitoring, μc-Si

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© 1998 Trans Tech Publications Ltd. All Rights Reserved

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