High Order X-ray Diffraction and Internal Atomic Layer Roughness of Epitaxial and Bulk SiC Materials

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Periodical:

Materials Science Forum (Volumes 338-342)

Edited by:

Calvin H. Carter, Jr., Robert P. Devaty, and Gregory S. Rohrer

Pages:

501-504

DOI:

10.4028/www.scientific.net/MSF.338-342.501

Citation:

G. Xu and Z. C. Feng, "High Order X-ray Diffraction and Internal Atomic Layer Roughness of Epitaxial and Bulk SiC Materials", Materials Science Forum, Vols. 338-342, pp. 501-504, 2000

Online since:

May 2000

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$35.00

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