Ionization Energies and Electron Mobilities in Phosphorus- and Nitrogen-Implanted 4H-Silicon Carbide

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Periodical:

Materials Science Forum (Volumes 338-342)

Edited by:

Calvin H. Carter, Jr., Robert P. Devaty, and Gregory S. Rohrer

Pages:

703-706

DOI:

10.4028/www.scientific.net/MSF.338-342.703

Citation:

M. A. Capano et al., "Ionization Energies and Electron Mobilities in Phosphorus- and Nitrogen-Implanted 4H-Silicon Carbide", Materials Science Forum, Vols. 338-342, pp. 703-706, 2000

Online since:

May 2000

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