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HomeMaterials Science ForumMaterials Science Forum Vols. 389-393Low-Temperature Preparation of α-SiC Epitaxial...

Low-Temperature Preparation of α-SiC Epitaxial Films by Nd: YAG Pulsed-Laser Deposition

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Silicon Carbide and Related Materials 2001

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Periodical:

Materials Science Forum (Volumes 389-393)

Pages:

375-378

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.389-393.375

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Online since:

April 2002

Authors:

Takeshi Kusumori, Hachizo Muto

Keywords:

Heteroepitaxy, Pulsed Laser Deposition (PLD), RHEED, α-SiC Thin Film, φ-Scan X-Ray Diffraction

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© 2002 Trans Tech Publications Ltd. All Rights Reserved

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