Annealing of Aluminum Implanted 4H-SiC: Comparison of Furnace and Lamp Annealing

Martin Rambach; Anton J. Bauer; Lothar Frey; Peter Friedrichs; Heiner Ryssel

doi:10.4028/www.scientific.net/MSF.483-485.621

Paper Titles

Fabrication of Compact Ion Implanter for Silicon Carbide Devices
p.605

Development of the Novel Electron Bombardment Anneal System (EBAS) for SiC Post Ion Implantation Anneal
p.609

Aluminium Implantation Induced Linear Surface Faults in 4H-SiC
p.613

Electrical Behavior of Implanted Aluminum and Boron near Tail Region in 4H-SiC after High-Temperature Annealing
p.617

Annealing of Aluminum Implanted 4H-SiC: Comparison of Furnace and Lamp Annealing
p.621

Ar Annealing at 1600°C and 1650°C of Al⁺ Implanted p⁺/n 4H-SiC Diodes: Analysis of the J-V Characteristics Versus Annealing Temperature
p.625

J-V Characteristics of Al⁺ Ion Implanted p⁺/n 4H-SiC Diodes Annealed in Silane Ambient at 1600°C
p.629

P-Type SiC Layers Formed by VLS Induced Selective Epitaxial Growth
p.633

Ion Beam Analysis and Computer Simulation of Damage Accumulation in Nitrogen Implanted 6H-SiC: Effects of Channeling
p.637

HomeMaterials Science ForumMaterials Science Forum Vols. 483-485Annealing of Aluminum Implanted 4H-SiC: Comparison...

Annealing of Aluminum Implanted 4H-SiC: Comparison of Furnace and Lamp Annealing

Abstract:

Furnace annealing and lamp annealing of aluminum implanted layers in 4H silicon carbide (SiC) were investigated with respect to surface degradation and electrical parameters. A sheet resistance of about 20kW/ı was obtained for an aluminum implantation dose of 1.2×1015cm-2 and annealing in the furnace at 1700°C for 30min. For the same implantation dose, lamp annealing at 1770°C for 5min resulted in a three times higher sheet resistance of 60kW/ı. The surface roughness was best for the lamp system and stayed below 1nm for Al doses lower than 1×1015cm-2.

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Silicon Carbide and Related Materials 2004

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Periodical:

Materials Science Forum (Volumes 483-485)

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621-624

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.483-485.621

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Online since:

May 2005

Authors:

Martin Rambach, Anton J. Bauer, Lothar Frey, Peter Friedrichs, Heiner Ryssel

Keywords:

Annealing, Ion Implantation, Sheet Resistance, Surface Roughness (SR)

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