Real Time Observation of SiC Oxidation Using an In Situ Ellipsometer

Abstract:

Article Preview

Real time observation of SiC oxidation was performed using an in-situ ellipsometer over the temperature range from 900°C to 1150°C. The relations between oxide thickness and oxidation time were obtained precisely by virtue of the real time measurements. We analyzed the relations between oxide thickness and oxidation time by applying the Deal and Grove model to obtain the linear and parabolic rate constants. Taking advantage of in-situ measurements, we successfully obtained the oxidation rate constants with high accuracy.

Info:

Periodical:

Materials Science Forum (Volumes 527-529)

Edited by:

Robert P. Devaty, David J. Larkin and Stephen E. Saddow

Pages:

1031-1034

Citation:

K. Kakubari et al., "Real Time Observation of SiC Oxidation Using an In Situ Ellipsometer", Materials Science Forum, Vols. 527-529, pp. 1031-1034, 2006

Online since:

October 2006

Export:

Price:

$38.00

[1] S. Yoshida: Electric Refractory Materials, ed. Y. Kumashiro (Marcel Dekker, New York, 2000) p.437.

[2] V. V. Afanas'ev, M. Bassler, G. Pensl and M. Schultz: Phys. Status Solidi A 162 (1997), p.312.

[3] R. C. A. Harris: J. Am. Ceram. Soc. 58 (1975), p.7.

[4] Y. Song, S. Dhar, L. C. Feldman, G. Chung and J. R. Williams: J. Appl. Phys. 95 (2004), p.4953.

[5] A. Suzuki, H. Ashida, N. Furui, K. Mameno and H. Matsunami: Jpn. J. Appl. Phys. 21 (1982), p.579.

[6] T. Narushima, T. Goto and T. Hirai: J. Am. Ceram. Soc. 72 (1989), p.1386.

[7] J. A. Costello and R. E. Tressler: J. Am. Ceram. Soc. 69 (1986), p.674.

[8] Z. Zheng, R. E. Tressler and K. E. Spear: J. Electrochem. Soc. 137 (1990), p.854.

[9] B. E. Deal and A. S. Grove: J. Appl. Phys. 36 (1965), p.3770.

[10] T. Iida, Y. Tomioka, M. Midorikawa, H. Tsukada, M. Orihara, Y. Hijikata, H. Yaguchi, M. Yoshikawa, H. Itoh, Y. Ishida and S. Yoshida: Jpn. J. Appl. Phys. 41 (2002), p.800.

DOI: https://doi.org/10.1143/jjap.41.800

[11] Y. Tomioka, T. Iida, M. Midorikawa, H. Tsukada, K. Yoshimoto, Y. Hijikata, H. Yaguchi, M. Yoshikawa, Y. Ishida, R. Kosugi and S. Yoshida: Mater. Sci. Forum 389 (2002), p.1029.

DOI: https://doi.org/10.4028/www.scientific.net/msf.389-393.1029

[12] G. E. Jellison, Jr: Optical Materials 1 (1992), p.151.

[13] T. Iida, Y. Tomioka, Y. Hijikata, H. Yaguchi, M. Yoshikawa, Y. Ishida, H. Okumura and S. Yoshida: Jpn. J. Appl. Phys. 39 (2000), p.1054.