Homoepitaxial Growth of 4H-SiC by Hot-Wall CVD Using BTMSM
Homoepitaxial growth of 4H-SiC epilayer by hot-wall chemical vapor deposition using bis-trimethylsilylmethane (BTMSM, C7H20Si2) precursor was investigated. The growth rate of 4H-SiC was investigated as a function of the growth temperature and source flow rate. The FWHM values of epilayers as the growth temperature and source flow rate also investigated. The growth rate of 4H-SiC epilayer grown by hot-wall CVD was 3.0 μm/h and the background doping level of 4H-SiC epilayer was mid 1015/cm3.
Akira Suzuki, Hajime Okumura, Tsunenobu Kimoto, Takashi Fuyuki, Kenji Fukuda and Shin-ichi Nishizawa
H. S. Seo et al., "Homoepitaxial Growth of 4H-SiC by Hot-Wall CVD Using BTMSM", Materials Science Forum, Vols. 600-603, pp. 151-154, 2009