Schottky Barrier 3C-SiC Nanowire Field Effect Transistor
Back-gated field effect transistors (FETs) based on catalyst-free grown 3C-SiC nanowire (NW) were fabricated. Devices with rectifying Source (S) and Drain (D) contacts have been observed. In contrast with the ohmic-like devices reported in the literature, the Schottky contact barrier (SB) at S/ D regions acts beneficially for the FET performance by suppressing the off-current. At high positive gate voltages (>10 V), the Schottky barriers tend to be more transparent leading to ION/IOFF ratio equal to ~ 103 in contrast to the weak gating effect of the ohmic-contacted 3C-SiC NWFETs.
Edouard V. Monakhov, Tamás Hornos and Bengt. G. Svensson
K. Rogdakis et al., "Schottky Barrier 3C-SiC Nanowire Field Effect Transistor", Materials Science Forum, Vols. 679-680, pp. 613-616, 2011