Growth of SiC Nanowires on Different Planes of 4H-SiC Substrates

Abstract:

Growth of SiC nanowires (NWs) on monocrystalline 4H-SiC substrates was conducted to investigate a possibility of NW alignment and polytype control. The growth directions of the NWs on the top surfaces and the vertical sidewalls of 4H-SiC mesas having different crystallographic orientations were investigated. The majority of the NWs crystallize in the 3C polytype with the growth axis. Six orientations of the 3C NWs axis with respect to the substrate were obtained simultaneously when growing on the (0001) plane. In contrast, no more than two NW axis orientations coexisted when growing on a particular mesa sidewall. Growth on a particular {10-10} plane resulted in only one NW axis orientation, giving well-aligned NWs.

• Periodical: Materials Science Forum (Volumes 717-720)
• Pages: 1279-1282
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.717-720.1279
• Online since: May 2012
• Authors: Rooban Venkatesh K.G. Thirumalai, Bharat Krishnan, Igor Levin, Albert Davydov, Siddarth G. Sundaresan, Joseph Neil Merrett, Yaroslav Koshka
• Keywords: Chemical Vapor Deposition (CVD), CVD, Epitaxial Growth, Nanowire

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