Lateral Growth Expansion of 4H/6H-SiС M-Plane Pseudo Fiber Crystals by Hot Wall CVD Epitaxy

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Abstract:

Lateral expansion of small mixed polytype 4H/6H-SiC and 6H-SiC slivers were realized by hot wall chemical vapor deposition (HWCVD). Small slivers cut from m-oriented (11 ̅00) SiC boule slices containing regions of 4H and 6H-SiC or just single polytype 6H-SiC were exposed to HWCVD conditions using standard silane/propane chemistry for a period of up to eight hours. The slivers exhibited approximately 1500 μm (1.5 mm) of total lateral expansion. Initial analysis by synchrotron white beam x-ray topography (SWBXT) confirms, that the lateral growth was homoepitaxial, matching the polytype of the respective underlying region of the seed sliver.

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Materials Science Forum (Volumes 717-720)

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33-36

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May 2012

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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