4H-SiC Trench Structure Schottky Diodes

Article Preview

Abstract:

This paper presents three different structures of Schottky diodes that were fabricated with low Schottky barrier heights. To reduce the forward voltage drop, the introduction of a lower Schttoky barrier is necessary. One of key issues associated with diodes having a low Schottky barrier height and a planar structure is an excessively high leakage current. By introducing the novel trench structure, the leakage current was reduced to a reasonable level. Furthermore it was confirmed that they have minimal switching time during turn-off and high avalanche capability. Thus trench structure Schottky diodes are able to reduce not only switching losses but also conductive losses and demonstrate sufficient robustness.

You might also be interested in these eBooks

Info:

Periodical:

Materials Science Forum (Volumes 717-720)

Pages:

933-936

Citation:

Online since:

May 2012

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2012 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] R. Rupp and I. Zverev, SiC Power Devices: How to be Competitive towards Si-Based Solutions?, Materials Science Forum Vols. 443-436 (2003) 805-812.

DOI: 10.4028/www.scientific.net/msf.433-436.805

Google Scholar

[2] M. Treu, R. Rupp, C. S. Tai, P. Blaschitz, J. Hilsenbeck, H. Brunner, D. Peters, R. Elpelt and T. Reimann, A Surge Current Stable and Avalanche Rugged SiC Merged pn Schottky Diode Blocking 600V Especially Suited for PFC Applications, Materials Science Forum Vols. 527-529 (2006) 1155-1158.

DOI: 10.4028/www.scientific.net/msf.527-529.1155

Google Scholar

[3] Peter Zacharias, Perspectives of SiC Power Devices in Highly Efficient Renewable Energy Conversion Systems, Materials Science Forum Vols. 615-617 (2009) 889-894.

DOI: 10.4028/www.scientific.net/msf.615-617.889

Google Scholar

[4] F. La Via, F. Roccaforte, S. Di Franco, V. Raineri, F. Moscatelli, A. Scorzoni and G. C. Cardinali, Comparison between Different Schottky Diode Edge Termination Structures: Simulations and Experimental Results, Materials Science Forum Vols. 433-436 (2003) 827-830.

DOI: 10.4028/www.scientific.net/msf.433-436.827

Google Scholar

[5] C. Ota, J. Nishio, K. Takao, T. Hatakeyama, T. Shinohe, K. Kojima, S. Nishizawa and H. Ohashi, Doping Concentration Optimization for Ultra-low-loss 4H-SiC Floating Junction Schottky Barrier Diode (Super-SBD), Materials Science Forum Vols. 615-617 (2009) 655-658.

DOI: 10.4028/www.scientific.net/msf.615-617.655

Google Scholar

[6] D. Perrone, M. Naretto, S. Ferrero, L. Scaltrito and C. F. Pirri, 4H-SiC Schottky Barrier Diodes Using Mo-, Ti- and Ni-Based Contacts, Materials Science Forum Vols. 615-617 (2009) 647-650.

DOI: 10.4028/www.scientific.net/msf.615-617.647

Google Scholar