Raman Spectroscopy and XPS Analysis of Epitaxial Graphene Grown on 4H-SiC (0001) Substrate under an Argon Pressure of 900 mbar Environment

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Abstract:

This paper investigated a feasible process of growing epitaxial graphene on 4H hexagonal poly-type of silicon carbide Si-faced polar surface (0001) under an argon pressure of 900 mbar conditions. Using Raman Spectroscopy, Scanning Electron Microscopy and X-ray Photoelectron Spectroscopy, epitaxial graphene grown at temperature 1600°C is confirmed to take shape weakly on 4H-SiC (0001) with an average domain size of several tens of nanometers, and this can be seen as the characteristic of initial formation of epitaxial graphene on substrate.

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Materials Science Forum (Volumes 740-742)

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125-128

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January 2013

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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