Characterization of Threading Edge Dislocation in 4H-SiC by X-Ray Topography and Transmission Electron Microscopy

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Abstract:

A threading dislocation (TD) in 4H-SiC, which was currently interpreted as a perfect threading edge dislocation (TED) by synchrotron monochromatic-beam X-ray topography (SMBXT) and molten KOH etching with Na2O2 additive, was performed comparative characterization using weak-beam dark-field (WBDF) and large-angle convergent-beam electron diffraction (LACBED) methods. The TD was suggested to be dissociated into a dislocation pair which can be observed in the WBDF image of g=-12-10. The TD, which was identified as b//[-12-10] by SMBXT observation, was unambiguously determined as b=1/3[-12-10] by LACBED analysis. In the case of perfect TED, it was found that the direction of Burgers vector derived from SMBXT observation corresponds to LACBED analysis.

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Materials Science Forum (Volumes 778-780)

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366-369

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February 2014

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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[2] D. Nakamura, S. Yamaguchi, I. Gunjishima, Y. Hirose, and T. Kimoto: J. Cryst. Growth 304 (2007) 57.

Google Scholar

[3] H. Yamaguchi and H. Matsuhata: J. Electron. Mater. 39 (2010) 715.

Google Scholar

[4] M. Dudley, F. Wu, H. Wang, S. Byrappa, B. Raghothamachar, G. Choi, S. Sun, E. K. Sanchez, D. Hansen, R. Drachev, S. G. Mueller, and M. J. Loboda: Appl. Phys. Lett. 98 (2011) 232110.

DOI: 10.1063/1.3597226

Google Scholar

[5] Y. Sugawara, M. Nakamori, Y. Yao, Y. Ishikawa, K. Danno, H. Suzuki, T. Bessho, S. Yamaguchi, K. Nishikawa and Y. Ikuhara, Appl. Phys. Express, 5, 081301 (2012).

DOI: 10.1143/apex.5.081301

Google Scholar

[6] S. Chung, V. Wheeler, R. Myers-Ward, C. R. Eddy, D. K. Gaskill, P. Wu, Y. N. Picard and M. Skowronski, J. Appl. Phys., 109, 094906 (2011).

DOI: 10.1063/1.3579447

Google Scholar

[7] X. Zhang and H. Tsuchida, J. Appl. Phys., 111, 123512 (2012).

Google Scholar

[8] M. Tanaka, M. Terauchi and T. Kaneyama, J. Electron Microsc., 40 (1991) 211.

Google Scholar

[9] J. P. Morniroli, R. K. W. Marceau, S.P. Ringer and L. Boulanger, Philos. Mag., 86 (2006) 4883.

Google Scholar

[10] Y. Yao, Y. Ishikawa, Y. Sugawara, H. Saitoh, K. Danno, H. Suzuki, Y. Kawai and N. Shibata, Mater. Sci. Forum, 679-680 (2011) 294.

Google Scholar

[11] T. Ohnishi, H. Koike, T. Ishitani, S. Tomimatsu, K. Umemura and T. Kamino, Proc. 25th Int. Symp. for Test. and Fail. Anal., (1999) 449.

Google Scholar

[12] H. Sasaki, T. Matsuda, T. Kato, T. Muroga, Y. Iijima, T. Saitoh, F. Iwase, Y. Yamada, T. Izumi, Y. Shiohara and T. Hirayama, J. Electron Microsc., 53 (2004) 497.

Google Scholar

[13] I. Kamata, M. Nagano, H. Tsuchida, Y. Chen and M. Dudley, Mater. Sci. Forum, 600-603 (2009) 305.

Google Scholar

[14] M. Dudley, S. Byrappa, H. Wang, F. Wu, Y. Zhang, B. Raghothamachar, G. Choi, E. Sanchez, D. Hansen, R. Drachev and M. Loboda, Mater. Res. Soc. Symp. Proc., 1246 (2010) 29.

DOI: 10.1557/proc-1246-b02-02

Google Scholar