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Origin Analyses of Trapezoid-Shape Defects in 4-Deg.-off 4H-SiC Epitaxial Wafers by Synchrotron X-Ray Topography
Abstract:
The trapezoid-shape defects are one of the most common surface defects on current 4H-SiC epitaxial film surface since they give rise negative impact for MOS-devices. We have investigated structures and origins of the defects. It is discovered that the possible origins of the trapezoid-shape defects are basal plane dislocations (BPDs), threading edge dislocations (TEDs), threading screw dislocations (TSDs),and the short dislocation loops introduced under scratches.
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374-377
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Online since:
February 2014
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© 2014 Trans Tech Publications Ltd. All Rights Reserved
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