Formation and Annihilation of Carbon Vacancies in 4H-SiC

Article Preview

Abstract:

The carbon vacancy (VC) is a major point defect in high-purity 4H-SiC epitaxial layers limiting the minority charge carrier lifetime. In layers grown by chemical vapor deposition techniques, the VC concentration is typically in the range of 1012 cm-3 and after device processing at temperatures approaching 2000 °C, it can be enhanced by several orders of magnitude. In the present contribution, we show that the cooling rate after high-temperature processing has a profound influence on the resulting VC concentration where a slow rate promotes elimination of VC. Further, isochronal annealing of as-grown and as-oxidized epi-layers protected by a carbon-cap was undertaken between 800 °C and 1600 °C. The results reveal that thermodynamic equilibrium of VC is established rather rapidly at moderate temperatures, reaching a VC concentration of only a few times 1011 cm-3 after 40 min at 1500 °C. Hence, the concept of eliminating VC’s by annealing at moderate temperatures under C-rich equilibrium conditions shows great promise and enables re-annealing of high-temperature processed wafers, in contrast to the procedures commonly used today to eliminate VC. In-diffusion of carbon interstitials and out-diffusion of VC’s are discussed as the kinetics processes establishing the thermodynamic equilibrium

You might also be interested in these eBooks

Info:

Periodical:

Pages:

331-336

Citation:

Online since:

May 2016

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2016 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] N. Kaji, H. Niwa, J. Suda and T. Kimoto, Mater. Sci. Forum 778-780 (2014) 832.

Google Scholar

[2] P. B. Klein, B. V. Shanabrook, S. W. Huh, A. Y. Polyakov, M. Skowronski, J. J. Sumakeris, and M. J. O'Loughlin, Appl. Phys. Lett. 88 (2006) 052110.

Google Scholar

[3] K. Danno, D. Nakamura, and T. Kimoto, App. Phys. Lett. 90 (2007) 202109.

Google Scholar

[4] A. Zywietz, J. Furthmüller, and F. Bechstedt, Phys. Rev. B 59 (1999) 15166.

Google Scholar

[5] T. Hornos, A. Gali, and B. G. Svensson, Mater. Sci. Forum 679 (2011) 261.

Google Scholar

[6] X. T. Trinh, K. Szász, T. Hornos, K. Kawahara, J. Suda, T. Kimoto, A. Gali, E. Janzén, and N. T. Son, Phys. Rev. B 88 (2013) 235209.

Google Scholar

[7] N. T. Son, X. T. Trinh, L. S. Løvlie, B. G. Svensson, K. Kawahara, J. Suda, T. Kimoto, T. Umeda, J. Isoya, T. Makino, T. Ohshima and E. Janzén, Phys. Rev. Lett. 109 (2012) 187603.

DOI: 10.1103/physrevlett.109.187603

Google Scholar

[8] T. Hiyoshi and T. Kimoto, Appl. Phys. Express 2 (2009) 041101.

Google Scholar

[9] L. S. Løvlie and B. G. Svensson, Phys. Rev. B86 (2012) 075205.

Google Scholar

[10] L. Storasta and H. Tsuchida, Appl. Phys. Lett. 90 (2007) 062116.

Google Scholar

[11] H. M. Ayedh, A. Hallén and B. G. Svensson, J. Appl. Phys. 118, 175701 (2015).

Google Scholar

[12] R. Nipoti, F. Mancarella, F. Moscatelli, R. Rizzoli, S. Zampolli and M. Ferri, Electrochem. Solid-State Lett. 13 (2010) H432.

DOI: 10.1149/1.3491337

Google Scholar

[13] B. G. Svensson, K. -H. Rydén and B. M. S. Lewerentz, J. Appl. Phys. 66 (1989) 1699.

Google Scholar

[14] S. D. Brotherton, Solid-State Electronics 26 (1983) 987.

Google Scholar

[15] E. V. Monakhov, J. Wong-Leung, A. Yu. Kuznetsov, C. Jagadish and B. G. Svensson, Phys. Rev. B 65 (2002) 245201.

Google Scholar

[16] H. M. Ayedh, V. Bobal, R. Nipoti, A. Hallén and B. G. Svensson, J. Appl. Phys. 115 (2014) 012005.

Google Scholar

[17] H. M. Ayedh, R. Nipoti, A. Hallén and B. G. Svensson, Mater. Sci. Forum 821-823 (2015) 351.

Google Scholar

[18] M. Bockstedte, A. Mattausch, and O. Pankratov, Phys. Rev. B68, 205201(2003).

Google Scholar

[19] H. M. Ayedh, R. Nipoti, A. Hallén and B. G. Svensson, Appl. Phys. Lett. 107 (2015), in press.

Google Scholar

[20] L. Storasta, H. Tsuchida, T. Miyazawa, and T. Ohshima, J. Appl. Phys. 103 (2008) 013705.

Google Scholar

[21] K. Kawahara, J. Suda and T. Kimoto, J. Appl. Phys. 111 (2012) 053710.

Google Scholar