4H-SiC Trench Structure Fabrication with Al2O3 Etching Mask

Tian Xiang Dai; Z. Mohammadi; Stephen Russell; Craig A. Fisher; Michael R. Jennings; Philip  Andrew Mawby

doi:10.4028/www.scientific.net/MSF.897.371

Paper Titles

Improved 4H-SiC N-MOSFET Interface Passivation by Combining N₂O Oxidation with Boron Diffusion
p.352

Enhanced Low-Temperature Oxidation of 4H-SiC Using SrTi_1-xMg_xO_3-δ
p.356

Study of Etching Processes for SiC Defect Analysis
p.363

Investigation on Wet Etching 4H-SiC Damaged by Ion Implantation
p.367

4H-SiC Trench Structure Fabrication with Al₂O₃ Etching Mask
p.371

Improving Mechanical Strength and Surface Uniformity to Prepare High Quality Thinned 4H-SiC Epitaxial Wafer Using Si-Vapor Etching Technology
p.375

Fabrication of Thick Free-Standing Lightly-Doped n-Type 4H-SiC Wafers
p.379

A Method to Adjust Polycrystalline Silicon Carbide Etching Rate Profile by Chlorine Trifluoride Gas
p.383

Demonstrating the Instability of SiC Ohmic Contacts and Drain Terminal Metallization Schemes Aged at 300 °C
p.387

HomeMaterials Science ForumMaterials Science Forum Vol. 8974H-SiC Trench Structure Fabrication with Al2O3...

4H-SiC Trench Structure Fabrication with Al₂O₃ Etching Mask

Abstract:

Trench structure etching is one of the most important processes for the fabrication of 4H-SiC Trench MOSFETs. This paper introduced Al₂O₃as an etching mask for the fabrication of trench structures. The effect of dry etching parameters to the shape of trench structures were studied systematically. Micro trenches were successfully eliminated from trench structure etching process and preliminary trench MOSFET test structures were fabricated and characterized.

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Silicon Carbide and Related Materials 2016

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Periodical:

Materials Science Forum (Volume 897)

Pages:

371-374

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.897.371

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Online since:

May 2017

Authors:

Tian Xiang Dai*, Z. Mohammadi, Stephen Russell, Craig A. Fisher, Michael R. Jennings, Philip Andrew Mawby

Keywords:

4H-SiC MOSFET, Al₂O₃, Ar, Etching Mask, Micro Trench, SF₆

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