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HomeSolid State PhenomenaSolid State Phenomena Vols. 103-104Measurement and Control of Airborne Molecular...

Measurement and Control of Airborne Molecular Contamination during Wafer Storage and Transport

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Ultra Clean Processing of Silicon Surfaces VII

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Periodical:

Solid State Phenomena (Volumes 103-104)

Pages:

259-264

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.103-104.259

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Online since:

April 2005

Authors:

Daniel Alvarez, Allan Tram, Russell J. Holmes

Keywords:

Airborne Molecular Contaminants, Contamination Control, FOUP, Parts-Per-Trillion Gas Delivery, SMIF, Wafer Repair, Wafer Storage, Wafer Transport, XCDA

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Сopyright:

© 2005 Trans Tech Publications Ltd. All Rights Reserved

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Citation:

[1] M. Veillerrot, Adrien Danel, Sybil Quiais-Marthon, and Francois Tardif, "Testing the Use of Purge Gas in Wafer Storage and Transport Containers," MICRO (August/September 2003): 57-63.

[2] Allan Tram, Jeffrey J. Spiegelman, Russell J. Holmes, Daniel Alvarez, Dan Lev, Proc. SPIE 5038, 22 (2003) Acknowledgements Mykrolis, Aeronex, and XCDA are registered trademarks of Mykrolis Corporation. Teflon is a registered trademark of E. I du Pont de Nemours and Company. Sulfinert is a registered trademark of Restek Corporation.