Measurement and Control of Airborne Molecular Contamination during Wafer Storage and Transport

Abstract:

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Periodical:

Solid State Phenomena (Volumes 103-104)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

259-264

DOI:

10.4028/www.scientific.net/SSP.103-104.259

Citation:

D. Alvarez et al., "Measurement and Control of Airborne Molecular Contamination during Wafer Storage and Transport", Solid State Phenomena, Vols. 103-104, pp. 259-264, 2005

Online since:

April 2005

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Price:

$35.00

[1] M. Veillerrot, Adrien Danel, Sybil Quiais-Marthon, and Francois Tardif, Testing the Use of Purge Gas in Wafer Storage and Transport Containers, MICRO (August/September 2003): 57-63.

[2] Allan Tram, Jeffrey J. Spiegelman, Russell J. Holmes, Daniel Alvarez, Dan Lev, Proc. SPIE 5038, 22 (2003).

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