Ultra Clean Processing of Silicon Surfaces VII

Volumes 103-104

doi: 10.4028/www.scientific.net/SSP.103-104

Paper Title Page

Authors: Alessio Beverina, M.M. Frank, H. Shang, S. Rivillon, F. Amy, C.L. Hsueh, V.K. Paruchuri, R.T. Mo, M. Copel, E.P. Gusev, M.A. Gribelyuk, Y.J. Chabal

Abstract: We review the impact of semiconductor surface preparation on the performance of metal-oxidesemiconductor field-effect transistor (MOSFET)...

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Authors: Casey C. Finstad, Anthony Muscat

Abstract: High-k gate materials, such as HfO2, are unstable on silicon and form low permittivity interfacial oxides when heated. A single layer of...

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Authors: Joel Barnett, Chadwin D. Young, Naim Moumen, Gennadi Bersuker, Jeff J. Peterson, George A. Brown, Byoung Hun Lee, Howard R. Huff
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Authors: Jeffery W. Butterbaugh, Steven L. Nelson, Thomas J. Wagener
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Authors: Bart Onsia, Matty Caymax, Thierry Conard, Stefan De Gendt, F. De Smedt, A. Delabie, C. Gottschalk, Marc M. Heyns, M. Green, S. Lin, Paul W. Mertens, W. Tsai, Chris Vinckier
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Authors: Bart Onsia, Thierry Conard, Stefan De Gendt, Marc M. Heyns, I. Hoflijk, Paul W. Mertens, Marc Meuris, G. Raskin, Sonja Sioncke, I. Teerlinck, Antoon Theuwis, Jan Van Steenbergen, Chris Vinckier
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Authors: Sven Van Elshocht, A. Delabie, B. Brijs, Matty Caymax, Thierry Conard, Bart Onsia, Riikka Puurunen, Olivier Richard, Jan Van Steenbergen, Chao Zhao, Marc Meuris, Marc M. Heyns
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Authors: F. Arnaud, H. Bernard, Alessio Beverina, R. El-Farhane, B. Duriez, Kathy Barla, Didier Lévy

Abstract: This paper investigates low temperature cleaning steps solutions (T°<30°) developed to enhance the 65nm transistor performance. A complete...

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Showing 1 to 10 of 87 Paper Titles