On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition

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Periodical:

Solid State Phenomena (Volumes 103-104)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

19-22

DOI:

10.4028/www.scientific.net/SSP.103-104.19

Citation:

B. Onsia et al., "On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition", Solid State Phenomena, Vols. 103-104, pp. 19-22, 2005

Online since:

April 2005

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$35.00

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