Volume is indexed by Thomson Reuters CPCI-S (WoS).
This book is sub-divided into 10 different topical sections; each dealing with important issues in surface cleaning and preparation.

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eBook:

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ToC:

Table of contents

Editors:

Paul Mertens, Marc Meuris and Marc Heyns

DOI:

https://doi.org/10.4028/b-Z2mHyn

THEMA:

TGM

BISAC:

TEC021000

Keywords:

Atomic Layer Deposition ALD, Cavitation, Cleaning, Contamination, Copper (Cu), Damage, Germanium, HF, HfO₂, High-k, Megasonic, Megasonic Cleaning, Ozone, Particle Removal, Single Wafer, Single Wafer Clean, Single Wafer Cleaning, Supercritical CO₂, Surfactant, Uniformity

Details:

Proceddings of the 7th International Symposium on Ultra Cleyn Processing of Silicon Surfaces (UCPSS), Brussels, Belgium, Sept. 20-22, 2004

Pages:

398

Year:

2005

ISBN-13 (softcover):

9783908451068

ISBN-13 (CD):

9783035719765

ISBN-13 (eBook):

9783038130253

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