Ultra Clean Processing of Silicon Surfaces VII

Volumes 103-104

doi: 10.4028/www.scientific.net/SSP.103-104

Paper Title Page

Authors: Philippe Garnier, G. Horellou, J.J. Calvier, D. Labaty, Didier Lévy
Authors: Ismail Kashkoush, Lewis Liu, Nick Yialamas, R. Novak
Authors: Koichiro Saga, Takeshi Hattori
Authors: Alex Kabansky, Harry Lee
Authors: Wan Sik Kim, Wan Goo Hwang, Il-Kyoung Kim, Ki-Young Yun, Kwang Myung Lee, Seung Ki Chae
Authors: Gyu Hyun Kim, Geun Min Choi, Young Wook Song

Abstract: This study deals with drying induced water marks dependency on the last cleaning methods, substrate conditions, and drying pre-step delaying...

Authors: S.I. Misat, G.G. Grozev, J.J. Versluijs

Abstract: Recently, the reduction of pattern collapse in 193nm resists with the help of a surfactinated rinse has been widely reported in the...

Authors: Wim Fyen, Sophia Arnauts, Frank Holsteyns, G. Doumen, Guy Vereecke, Jan Van Steenbergen, Paul W. Mertens

Abstract: In this paper, a single wafer linear IPA vapour based vertical drying technique is presented. Using salt residue tests the performance of...

Authors: Katsuhiko Miya, Takuya Kishimoto, Akira Izumi

Showing 11 to 20 of 87 Paper Titles