Ultra Clean Processing of Silicon Surfaces VII
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Abstract: This study deals with drying induced water marks dependency on the last cleaning methods, substrate conditions, and drying pre-step delaying...
Abstract: Recently, the reduction of pattern collapse in 193nm resists with the help of a surfactinated rinse has been widely reported in the...
Abstract: In this paper, a single wafer linear IPA vapour based vertical drying technique is presented. Using salt residue tests the performance of...