Impact of NiSi2 Precipitates Electronic Structure on the Minority Carrier Lifetime in n-and p-Type Silicon

M.V. Trushin; O.F. Vyvenko; Michael Seibt

doi:10.4028/www.scientific.net/SSP.131-133.155

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HomeSolid State PhenomenaSolid State Phenomena Vols. 131-133Impact of NiSi2 Precipitates Electronic Structure...

Impact of NiSi₂ Precipitates Electronic Structure on the Minority Carrier Lifetime in n-and p-Type Silicon

Abstract:

Minority carrier diffusion lengths were measured for the set of n- and p-type silicon samples with NiSi2 precipitates of different electronic structure. We found that the type of precipitate electronic states in the upper part of band gap had no influence on the recombination activity of NiSi2 precipitates. Minority carrier diffusion length L was found to be related to the precipitate density N and L ~ 2 × N -1/3 for n-type Si samples and L ~ 1 × N -1/3 for p-Si samples. Hydrogenation of the p-type Si sample with nanoscale nickel silicide precipitates resulted in an increase of the L value up to a factor of 3, while in n-Si L remained practicaly the same. The only hole emission in the samples of both conductivity types was detected in MCTS measurements and the cross section for the hole capture with the electronic states of the precipitaes was estimated to be as large as 10-11 cm-2.

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Periodical:

Solid State Phenomena (Volumes 131-133)

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155-160

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.131-133.155

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Online since:

October 2007

Authors:

M.V. Trushin, O.F. Vyvenko, Michael Seibt

Keywords:

Hydrogenation, Minority Carrier Diffusion Length, Nickel Silicide, Precipitation, Silicon

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