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HomeSolid State PhenomenaSolid State Phenomena Vol. 134Preparation, Characterization, and Damage-Free...

Preparation, Characterization, and Damage-Free Processing of Advanced Multiple-Gate FETs

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Ultra Clean Processing of Semiconductor Surfaces VIII

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Periodical:

Solid State Phenomena (Volume 134)

Pages:

213-216

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.213

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Online since:

November 2007

Authors:

Jeffrey M. Lauerhaas, Rinn Cleavelin, Wei Ze Xiong, Koki Mochizuki, Kara Sherman, Hu Cheng Lee, Brian Clappin, Thomas Schulz, Klaus Schruefer

Keywords:

Damage-Free Processing, Multiple-Gate FET, Silicon Fin

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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