Ex Situ Bubble Generation, Enhancing the Particle Removal Rate for Single Wafer Megasonic Cleaning Processes

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

201-204

DOI:

10.4028/www.scientific.net/SSP.134.201

Citation:

F. Holsteyns et al., "Ex Situ Bubble Generation, Enhancing the Particle Removal Rate for Single Wafer Megasonic Cleaning Processes", Solid State Phenomena, Vol. 134, pp. 201-204, 2008

Online since:

November 2007

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Price:

$35.00

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