Ex Situ Bubble Generation, Enhancing the Particle Removal Rate for Single Wafer Megasonic Cleaning Processes

Frank Holsteyns; Tom Janssens; Sophia Arnauts; Wouter Van der Putte; Vincent Minsier; Johann Brunner; Joachim Straka; Paul W. Mertens

doi:10.4028/www.scientific.net/SSP.134.201

Paper Titles

New FEOL Cleaning Technology for Advanced Devices beyond 45 nm Node
p.185

In Situ Particle Removal Studies Using an Optical Particle Counter
p.189

Removal of Nano-Particles by Mixed-Fluid Jet: Evaluation of Cleaning Performance and Comparison with Megasonic
p.193

Modeling of Shock Wave Emission during Acoustically-Driven Cavitation-Induced Cleaning Processes
p.197

Ex Situ Bubble Generation, Enhancing the Particle Removal Rate for Single Wafer Megasonic Cleaning Processes
p.201

New Brush Scrubbing Techniques for a Wafer Bevel, Apex and Edge
p.205

Low Si Recess on Cleaning Process by Dilute HF/SC-1 with Megasonic
p.209

Preparation, Characterization, and Damage-Free Processing of Advanced Multiple-Gate FETs
p.213

Impact of Re-Gasified Water on Megasonic Cleaning
p.217

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Ex Situ Bubble Generation, Enhancing the Particle Removal Rate for Single Wafer Megasonic Cleaning Processes

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Periodical:

Solid State Phenomena (Volume 134)

Pages:

201-204

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.201

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Online since:

November 2007

Authors:

Frank Holsteyns, Tom Janssens, Sophia Arnauts, Wouter Van der Putte, Vincent Minsier, Johann Brunner, Joachim Straka, Paul W. Mertens

Keywords:

Bubble Generation, Cavitation, Megasonic, Nozzle

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References

[1] F. Holsteyns et al.: Proc. Forum Acsouticum 2002, Sevilla, Spain, September 16-20 (2002).

Google Scholar

[2] Holsteyns F. et al. : Proc. UCPSS 2004, Solid State Phenomena, 103, 159-162 (2005).

Google Scholar

[3] Holsteyns F. Et al.: Proc. Eight Intern. Symp. Cleaning Tech. Electrochem. Soc. PV 2003-26, 161-167 (2004).

Google Scholar

[4] Vereecke G. et al. : Proc. UCPSS 2004, Solid State Phenomena, 103, 141-146 (2005).

Google Scholar

[5] Gilmore, F. R., Rep. No. 26-4, Hydro-dynamics laboratory, California Institute of Technology, Pasadena California, USA (1952).

Google Scholar

[6] E.A. Neppiras. Acoustic cavitation. North-Holland Publishing Company, Amsterdam, (1980).

Google Scholar

[7] D. -Y. Hsieh and M.S. Plesset. Theory of rectified diffusion of mass into gas bubbles. J. Acoust. Soc. Am. 33, 2, 206-215, (1961).

DOI: 10.1121/1.1908621

Google Scholar

[8] M. O. Schmidt et al.: Proc. UCPSS 2002, Solid State Phenomena, 92, 147-150 (2003).

Google Scholar

[9] Janssens et al.: published in proceedings UCPSS 2006. Fig. 8: 78nm SiO2 removal efficiency for a 1 MHz nozzle, 60sec process and 1SLM UPW gasified at different levels and different power levels. Fig. 9: Cross section of the PRE map low power/low gas versus high power/high gas.

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