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HomeSolid State PhenomenaSolid State Phenomena Vol. 134New FEOL Cleaning Technology for Advanced Devices...

New FEOL Cleaning Technology for Advanced Devices beyond 45 nm Node

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Ultra Clean Processing of Semiconductor Surfaces VIII

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Periodical:

Solid State Phenomena (Volume 134)

Pages:

185-188

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.185

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Online since:

November 2007

Authors:

Hiroshi Tomita, Yuji Yamada, Hidenobu Nagashima, Norio Ishikawa, Yumiko Taniguchi

Keywords:

Dispersion Agent, Ozonated Water, Particle Removal, Surface Charge, Wet Cleaning

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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