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HomeSolid State PhenomenaSolid State Phenomena Vol. 134The Active Role of Etch Products in Particle...

The Active Role of Etch Products in Particle Removal by SC-1 Solutions

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Ultra Clean Processing of Semiconductor Surfaces VIII

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Periodical:

Solid State Phenomena (Volume 134)

Pages:

181-184

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.181

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Online since:

November 2007

Authors:

Alexander Pfeuffer, Wolfgang Bensch, Alfred Lechner, Harald Okorn-Schmidt

Keywords:

Etch Products, SC-1, Silicon, Van der Waals Force

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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[1] M. Itano, F. W. Kern, Jr., M. Miyashita, and T. Ohmi: IEEE Transactions on Semiconductor Manufacturing 6 (1993), pp.258-267.

[2] A. Pfeuffer, W. Bensch, A. Lechner, and H. F. Okorn-Schmidt: Proceedings of the Seventh International Symposium on Ultra Clean Processing of Silicon Surfaces (2004), pp.163-166.

[3] R. K. Iler: The Chemistry of Silica (John Wiley & Sons, Inc., New York, USA 1979), p.374.