A Study of a Single-Wafer Process in Metal Contact Hole Cleaning

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

177-180

DOI:

10.4028/www.scientific.net/SSP.134.177

Citation:

J. Y. Park et al., "A Study of a Single-Wafer Process in Metal Contact Hole Cleaning", Solid State Phenomena, Vol. 134, pp. 177-180, 2008

Online since:

November 2007

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$35.00

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