Study of the Dynamics of Local Particle Removal Efficiencies Using Localized Haze Maps

Abstract:

Article Preview

The local particle removal efficiency (PRE) of nano particles in megasonic cleaning experiments is studied. This approach makes it possible to quantify non uniform cleaning effects over the wafer and to look into the dynamics of particle removal at different areas on the wafer. A direct correlation between PRE and megasonic induced damage of device structures demonstrates that a considerable amount of damage is already formed at less efficiently cleaned areas of the wafer.

Info:

Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

233-236

DOI:

10.4028/www.scientific.net/SSP.134.233

Citation:

T. Janssens et al., "Study of the Dynamics of Local Particle Removal Efficiencies Using Localized Haze Maps", Solid State Phenomena, Vol. 134, pp. 233-236, 2008

Online since:

November 2007

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.