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Effect of Ozone Supply Methods on PRE in Alkaline Ozone Solutions
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Challenges of Single-Wafer Wet Cleaning for Low Temperature Pre-Epitaxial Treatment of SiGe
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HomeSolid State PhenomenaSolid State Phenomena Vol. 134Challenges of Single-Wafer Wet Cleaning for Low...

Challenges of Single-Wafer Wet Cleaning for Low Temperature Pre-Epitaxial Treatment of SiGe

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Ultra Clean Processing of Semiconductor Surfaces VIII

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Periodical:

Solid State Phenomena (Volume 134)

Pages:

243-246

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.243

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Online since:

November 2007

Authors:

Kenichi Sano, Frederik E. Leys, G. Dilliway, Roger Loo, Paul W. Mertens, James Snow, Akira Izumi, Atsuro Eitoku

Keywords:

Dry, Epi, HF, Silicon, Silicon-Germanium (SiGe), Single Wafer Cleaning

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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