Effect of Ozone Supply Methods on PRE in Alkaline Ozone Solutions

Seung Ho Lee; Tae Gon Kim; Tae Young Kwon; Jin Goo Park; So Ik Bae; Gun Ho Lee; In Jung Kim

doi:10.4028/www.scientific.net/SSP.134.237

Paper Titles

The Removal of Silica Particles from Micron Wide Trenches by Megasonic Cleaning
p.221

Is there Gas Entrapped on Submerged Silicon Wafers? Visualizing Nano-Scale Bubbles with Cavitation
p.225

Acoustic Field Analysis of a T Type Waveguide in Single Wafer Megasonic Cleaning and its Effect on Particle Removal
p.229

Study of the Dynamics of Local Particle Removal Efficiencies Using Localized Haze Maps
p.233

Effect of Ozone Supply Methods on PRE in Alkaline Ozone Solutions
p.237

Challenges of Single-Wafer Wet Cleaning for Low Temperature Pre-Epitaxial Treatment of SiGe
p.243

Estimation of Detrimental Impact of New Metal Candidates in Advanced Microelectronics
p.247

Plastic Containers Contamination by Volatile Acids : Accumulation, Release and Transfer to Cu-Surfaces during Wafers Storage
p.251

A Study on Germanium as a Contaminant Source in Semiconductor Fabrication Process
p.255

HomeSolid State PhenomenaSolid State Phenomena Vol. 134Effect of Ozone Supply Methods on PRE in Alkaline...

Effect of Ozone Supply Methods on PRE in Alkaline Ozone Solutions

Abstract:

Ozonated DI water was supplied to make alkaline cleaning solutions to replace SC1 chemicals in a bath with and without recirculation. With recirculation, low dissolved ozone and low pH cause lower particle removal efficiency (PRE) of 75%. However, direct supply of ozonated water with NH4OH to a bath without recirculation resulted in higher PRE over 93 %.

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Periodical:

Solid State Phenomena (Volume 134)

Pages:

237-240

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.237

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Online since:

November 2007

Authors:

Seung Ho Lee, Tae Gon Kim, Tae Young Kwon, Jin Goo Park, So Ik Bae, Gun Ho Lee, In Jung Kim

Keywords:

Additive Gases, Alkaline Solution, Ozone, Ozone Supply Methods, Particle Removal

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