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HomeSolid State PhenomenaSolid State Phenomena Vol. 134X-Ray Spectrometry for Wafer Contamination...

X-Ray Spectrometry for Wafer Contamination Analysis and Speciation as Well as for Reference-Free Nanolayer Characterization

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Ultra Clean Processing of Semiconductor Surfaces VIII

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Periodical:

Solid State Phenomena (Volume 134)

Pages:

277-280

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.277

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Online since:

November 2007

Authors:

Burkhard Beckhoff, R. Fliegauf, Michael Kolbe, M. Müller, B. Pollakowski, J. Weser, Gerhard Ulm

Keywords:

Contamination Analysis, GIXRF, Nanolayer Characterization, NEXAFS, Speciation, Synchron Radiation, TXRF, XRF

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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[1] B. Beckhoff, R. Fliegauf, G. Ulm, J. Weser, G. Pepponi, C. Streli, P. Wobrauschek, T. Ehmann, L. Fabry, C. Mantler, S. Pahlke, B. Kanngießer, W. Malzer, Electrochem. Soci. Proceedings Analytical and Diagnostic Techniques for Semiconductor Materials, Devices and Processes, 2003-03 (2003).

DOI: 10.4028/www.scientific.net/ssp.92.165

[2] C. Streli, P. Wobrauschek, L. Fabry, S. Pahlke, F. Comin, R. Barett, P. Pianetta, K. Lüning, B. Beckhoff, Total-Reflection X-Ray Fluorescence (TXRF) Wafer Analysis, Handbook of Practical X-Ray Fluorescence Analysis.

DOI: 10.1002/9783527636921.ch17

[3] M. Müller, B. Beckhoff, G. Ulm, B. Kanngießer, Phys. Rev. A 74 (2006), p.012702.

[4] F. Scholze, B. Beckhoff, M. Kolbe, M. Krumrey, M. Müller, G. Ulm, Microchim. Acta (2006), DOI: 10. 1007/s00604-006-0555-4, in press.

DOI: 10.1007/s00604-006-0555-4

[5] G. Pepponi, B. Beckhoff, T. Ehmann, G. Ulm, C. Streli, L. Fabry, S. Pahlke, P. Wobrauschek, Spectrochim. Acta B 58 (2003), p.2245.

DOI: 10.1016/s0584-8547(03)00217-9

[6] J. Osan, S. Török, B. Beckhoff, G. Ulm, H. Hwang, C. -U. Ro, C. Abete, R. Fuoco, Atmosph. Environm. 40 (2006), p.4691.

DOI: 10.1016/j.atmosenv.2006.04.033

[7] M. Kolbe, B. Beckhoff, M. Krumrey, G. Ulm, Spectrochim. Acta B 60 (2005).