Effect of Wafer Rotation on Photoresist Stripping in Supercritical CO2

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Periodical:

Solid State Phenomena (Volume 134)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

355-358

DOI:

10.4028/www.scientific.net/SSP.134.355

Citation:

K. Saga et al., "Effect of Wafer Rotation on Photoresist Stripping in Supercritical CO2", Solid State Phenomena, Vol. 134, pp. 355-358, 2008

Online since:

November 2007

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$35.00

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